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Help CenterSupply Xinyouyan Spin Coater Siyouyen kw - 4a Small Spin Coater With Adsorption Coating and High Rotation Speed
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Spin Coater
Spin Coater: (Spin Coater) is suitable for spin coating of semiconductor silicon wafers, etc. It has a wide range of applications, including surface coating or photolithography spin coating for various colloids on silicon wafers, wafers, substrates, ITO conductive glass, etc.
Detailed introduction: Spin Coater (English name: Spin Coater)
Industry common names: spin coating table, spin coater, glue applicator, coating machine, coater, spin coater, spin coater, etc.
Model KW-4A
Product overview:
The KW series spin coater of the SIYOUYEN brand is suitable for surface coating in the processes of semiconductor silicon wafers, glass slides, wafers, substrates, ITO conductive glass, etc., and in plate making.
The stable rotation speed and rapid start of the spin coater can ensure the consistency and uniformity of the glue thickness in semiconductors, which is exactly the feature of the KW series spin coater.
The spin coater of Xin Youyan Electronics Technology Co., Ltd. has adopted many advanced technologies in this regard:
(1) This equipment uses internationally advanced technology and imported accessories (stator and rotor imported from South Korea, DC motor), which makes the high - speed acceleration more stable and the control more accurate. The motor uses a new type of DC permanent - magnet motor to resist electromagnetic interference.
(2) The stator and the rotor are powered separately. The stator is supplied with excitation current by a stable power supply, and the rotor is speed - regulated by a switching power supply, which is much superior to silicon - controlled speed regulation. The rotation speed is very stable in the range of 1000 - 8000 revolutions per minute. It will not rotate when the vacuum is not obtained, ensuring the reliability of use.
(3) This spin coater has two rotation speeds. After starting, it runs at a low speed first to spread the glue, and then automatically changes to high - speed operation. The two rotation speeds and the corresponding times can be adjusted respectively.
(4) This spin coater uses the photoelectric method for speed measurement. There are three notches (reflective band and absorption band) on the edge of the photoelectric speed - measuring disk, distributed around the disk. A photoelectric switch is installed under the edge of the disk. When the light source shines on the photoelectric disk and is reflected to the receiver, a photoelectric pulse is generated. When the speed - measuring disk rotates one week, three pulses are generated. The gate is generated by the second - pulse circuit with a period of two seconds. When the motor rotates, if the number counted by the timer in 2 seconds is n, then it should rotate n/(2x3)=n/6 revolutions per second, and (n/6)x60 = 10n revolutions per minute. Therefore, the counter shows the rotation speed per minute, just with a difference in magnitude.
(5) The "wafer suction" is controlled by a solenoid valve for the air path, which is suitable for the assembly - line process. One air pump can drive several spin coaters to work simultaneously, improving the efficiency.
(6) The timing function of the spin coater is completed by the time - base circuit 556. By connecting 556 in a monostable form and changing the RC constant, the two spin - coating times can be changed.
(7) The spin - coating time is intelligently adjusted, with the times controlled at 1 - 18 seconds and 3 seconds - 1 minute respectively.
(8) In the installation structure, vibration - damping measures are taken to ensure low noise during operation, ensure the uniformity of the coated surface, and ensure that the coating thickness can be adjusted by adjusting the rotation speed.
Note* The spin coater should be used with a vacuum pump (It is recommended to use the two-stage oil-free environmental protection vacuum pump Model SK-65C in combination).
Performance indicators:
1. It is a dual-speed spin coater. The two-speed settings and spin coating time can be continuously controlled respectively. After starting, it runs at a low speed first and then automatically switches to a high speed after a few seconds. It can also use the low speed or high speed alone.
Gear I Speed adjustment range: 500 - 2000 revolutions per minute Gear I Spin coating time: 2 - 18 seconds
Gear II Speed adjustment range: 1300 - 8000 revolutions per minute Gear II Spin coating time: 3 - 60 seconds
2. LED digital display. Speed stability: ±1% , Uniformity of the glue: ±3% .
3. Power supply voltage: 220V/ 50Hz
4. Motor power: 40W
5. Applicable for spin coating of silicon wafers with a diameter of Φ5 - Φ100mm or other materials. (Trays of various models are available for purchase or free special customization is provided)
6. The pumping speed of the vacuum pump ≥60L/S
7. The product is small in size, light in weight, easy to operate and maintain.
The main dimensions of the spin coater: 210×220×160 mm
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