German Technical Background VOK-1791 Defoamer Spontaneous Defoaming Effect Replaces BYK-1791

German technical background VOK ®- DF 1791 Defoamer

VOK®- DF 1791 Aromatic free polymer defoamer (organic silicon free). It is used in radiation curing systems (wood and industrial coatings, printing inks and adhesives) with spontaneous defoaming effect, high transparency and low shrinkage tendency.

Product Information

Chemical composition

Polyolefin solution

Typical Physicochemical Data

The data given in this data page are only typical values, not technical indicators of the product.

Density (20 ° C): 0.80 g/ml

Non volatile matter (10 minutes, 150 ° C): 40.5%

Solvent: isoalkane

Flash point: 37 ° C

Application field

Paint and printing ink

Product features and advantages

VOK®- DF 1791 has a spontaneous defoaming effect, and has a high transparency and low shrinkage cavity trend. It is recommended for solvent based and solvent-free systems, especially for radiation curing wood and industrial coatings, printing inks and finishing varnishes.

Recommended dosage

0.1-1.5% of auxiliary dosage (supply form) is based on the general formula.

The above recommended dosage is for reference, and the appropriate dosage shall be determined through a series of tests.

Adding method and processing guidance

Due to the high incompatibility, the defoamer must be added under high shear force (grinding process) to ensure good dispersion. Otherwise, the system may have defects.

Adhesives&Sealants

Product features and advantages

VOK®- DF 1791 is recommended for solvent-free, radiation curing (UV and electron beam) adhesives.

Recommended dosage

0.1-1.5% of auxiliary dosage (supply form) is based on the general formula.

The above recommended dosage is for reference, and the appropriate dosage shall be determined through a series of tests.

Adding method and processing guidance

Due to the high incompatibility, the defoamer must be added under high shear force (grinding process) to ensure good dispersion. Otherwise, the system may have defects.