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Home > Metallurgy, Mineral & Energy > Non-ferrous Metal & Products > Niobium > Niobium Targets 99.95% Purity Niobium Sputtering Targets Customize Size Metal Nb Niobium Disc Plate Rod

Niobium Targets 99.95% Purity Niobium Sputtering Targets Customize Size Metal Nb Niobium Disc Plate Rod

Product Spotlights

99.95% purity customize size

Negotiable MOQ: 1 Piece (Price negotiable depending on order volume and customization)

Key Specifications

Shape:

Rectangular

Purity:

>99.95%

Application:

Electronics, Industrial, Medical, Chemical

Changsha Xinkang Advanced Materials Co., Ltd.

Payment & Shipping

Payment Methods:

Port of Shipment:

Changsha

Delivery Detail:

20 days

Shape Rectangular

Purity >99.95%

Application Electronics, Industrial, Medical, Chemical

Standard ASTM

Secondary Non-secondary

Alloy Non-alloy

Transport Package Vaccuum Blister

Specification As request

Trademark none

Origin China

Shape : Planar target, Rotary target
Niobium sputtering target has the same function as its raw material. Niobium is a strong, light grey, crystalline, and ductile transition metal. Pure Niobium has a hardness similar to that of pure titanium, and it has similar ductility to iron.Niobium is used in various superconducting materials. These superconducting alloys, also containing titanium and tin, are widely used in the superconducting magnets of MRI scanners. Other applications of niobium include welding, nuclear industries, electronics, optics, numismatics, and jewelry.
Niobium Sputtering Target is produced by EB melting technology, it's usually applied for touch screen, optical lenses and glass coatingusually applied for touch screen, optical lenses and glass coating.
XK is a professional producer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to our special forming processes, our Niobium sputtering targets possess higher density, smaller average particle size as well as high purity, so that you can benefit from a faster process due to higher sputtering speed and obtain very homogeneous Niobium layers.