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Tin Targets 99.95% Purity Tin Sputtering Targets Customize Size Metal Sn Tin Disc Plate Rod

Tin Targets 99.95% Purity Tin Sputtering Targets Customize Size Metal Sn Tin Disc Plate Rod photo-1
Tin Targets 99.95% Purity Tin Sputtering Targets Customize Size Metal Sn Tin Disc Plate Rod photo-2
Tin Targets 99.95% Purity Tin Sputtering Targets Customize Size Metal Sn Tin Disc Plate Rod photo-3
Tin Targets 99.95% Purity Tin Sputtering Targets Customize Size Metal Sn Tin Disc Plate Rod photo-4

Product Spotlights

99.95% purity customize size
Negotiable MOQ: 1 Piece (Price negotiable depending on order volume and customization)
Key Specifications
Get Latest Price
Shape:
Rectangular
Purity:
>99.99%
Application:
Electronics, Industrial, Medical, Chemical
Payment & Shipping
Payment Methods:
Port of Shipment:
Changsha
Delivery Detail:
20 days
Shape Rectangular
Purity >99.99%
Application Electronics, Industrial, Medical, Chemical
Standard ASTM
Secondary Non-secondary
Alloy Non-alloy
Transport Package Vaccuum Blister
Specification As request
Trademark none
Origin China


  • Attributes Name : High purity metal sputtering target

  • Product Name : Tin Sputtering Target

  • Element Symbol : Sn

  • Purity : 3N, 4N,5N

  • Shape : Planar target, Rotary target

  • Tin sputtering target has the same function as its raw material. Tin is a strong, light grey, crystalline, and ductile transition metal. Pure tin has a hardness similar to that of pure indium, are widely used in the superconducting magnets of MRI scanners. Other applications of niobium include welding, nuclear industries, electronics, optics, numismatics, and jewelry.


  • Tin Sputtering Target is produced by EB melting technology, it's usually applied for touch screen, optical lenses and glass coatingusually applied for touch screen, optical lenses and glass coating.


  • XK is a professional producer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to our special forming processes, our Niobium sputtering targets possess higher density, smaller average particle size as well as high purity, so that you can benefit from a faster process due to higher sputtering speed and obtain very homogeneous Niobium layers.


Product Tags: thin film coating , research

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