Contact Platform Support
Help CenterXinKang Tantalum Targets 99.95% Purity Tantalum Sputtering Targets Customize Size
Related Products
-
Nickel Sputtering Targets 99.995% Ni Nickel Targets for PVD CoatingUS$ 85 - 200MOQ: 1 Piece -
XinKang Niobium Targets 99.95% Purity Nb Niobium Sputtering Targets Customize SizeUS$ 55 - 185MOQ: 1 Piece
-
XinKang Vanadium Targets 99.95% Purity V Vanadium Sputtering Targets Customize SizeUS$ 55 - 185MOQ: 1 Piece
-
XinKang Chromium Targets 99.95% Purity Cr Chromium Sputtering Targets Customize SizeUS$ 55 - 185MOQ: 1 Piece
-
XinKang Cobalt Targets 99.95% Purity Co Cobalt Sputtering Targets Customize SizeUS$ 55 - 125MOQ: 1 Piece
| Name | Metal tantalum sputtering target |
| Purity | 99.95% |
| Size | 1inch,2inch,3inch etc. support customize size |
| MOQ | 1PC |
Tantalum sputtering target is composed of high-purity steel gray tantalum metal. Tantalum is a bluish-gray glossy transition metal with high corrosion resistance. It is part of the refractory metal category and is widely used as a minor component in alloys. Tantalum is dark (blue-gray), dense, ductile, very hard, easy to manufacture, and has high thermal and electrical conductivity. This metal is known for its resistance to acid corrosion. In fact, at temperatures below 150°C, tantalum is almost completely immune to normal aqua regia.
Tantalum Sputtering Target is produced by EB melting. It's usually applied for magnetic recording media, printer components, flat panel displays, optic, industrial glass, and thin film resistors. High purity Tantalum Sputtering Target is normally used for semiconductor industry. Its high natural strength with low thermal expansion coefficient, together with its ability to stick to both copper and silicon make it the perfect choice for a diffusion barrier to prevent copper and silicon from interacting.
XK is a professional producer of Tantalum sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to our special forming processes, our Tantalum sputtering targets possess higher density, smaller average particle size as well as higher purity, so that you can benefit from a faster process due to higher sputtering speed and obtain very homogeneous Tantalum layers.
The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our tantalum sputtering target, the average grain size＜100μm.
Chemical Specification:
The form below is a typical certificate of 99.95% pure Tantalum Sputtering Target:
Related Sputtering Materials
Tantalum Oxide (Ta2O5) Sputtering TargetCoTaZr Sputtering TargetTantalum PelletsTantalum Crucible liner
Send Inquiry to This Supplier
You May Also Like
-
Tantalum Plate Targets 99.95% Ta Tantalum Targets Plate Sheet for PVD CoatingUS$ 85 - 200MOQ: 1 Piece
-
Iridium Sputtering Targets 99.95% Pure Ir Iridium Disc Targets for Thin Film CoatingNegotiableMOQ: 1 Piece
-
Aluminum Sputtering Targets 99.99% Al Aluminum Targets for PVD CoatingNegotiableMOQ: 1 Piece
-
Tantalum Sputtering Targets 99.95% Ta Tantalum Targets for PVD CoatingUS$ 85 - 200MOQ: 1 Piece
-
Xinkang Produce Nickel Vanadium Alloy Target NiV Alloy NiV7 NiV93/7wt% Sputtering TargetsUS$ 100 - 185MOQ: 1 Piece
-
Factory Supply Nickel Vanadium Sputtering Target NiV Alloy Target NiV7 NiV93/7wt% for PVD CoatingUS$ 85 - 185MOQ: 1 Piece
-
Factory Supply Nickel Chromium Sputtering Target NiCr Alloy Target NiCr20 NiV80/20wt% for PVD CoatingUS$ 85 - 185MOQ: 1 Piece
-
99.95% Ni Nickel Pellets D3x3mm 1-10mm Metal Nickel Granules for Nickel Evaporation MaterialsUS$ 75 - 125MOQ: 1 Kilogram
-
Nickel Copper (NiCu) Sputtering Target Customize Size for PVD CoatingUS$ 85 - 125MOQ: 1 Piece
-
99.99% Purity Nickel Pellets D3x3mm D6x6mm Nickel Granules Evaporation MaterialsUS$ 55 - 135MOQ: 1 Kilogram
