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Help CenterXinKang Vanadium Targets 99.95% Purity V Vanadium Sputtering Targets Customize Size
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Vanadium (V) Sputtering Target
| Name | Metal Vanadium sputtering target |
| Purity | 99.95% |
| Size | 1inch,2inch,3inch etc. support customize size |
| MOQ | 1PC |
Vanadium sputtering target shares properties with its source material. Vanadium is a chemical element with symbol V and atomic number 23. It is a hard, silvery-grey, ductile, malleable transition metal. The elemental metal is rarely found in nature, but once isolated artificially, the formation of an oxide layer (passivation) somewhat stabilizes the free metal against further oxidation.Vanadium is electrically conductive and thermally insulating, and it’s harder than most metals and steel. It has good resistance to corrosion and it is stable against alkalis and sulfuric and hydrochloric acids. It is oxidized in air at about 933 K(660 °C, 1220 °F), although an oxide passivation layer forms even at room temperature.
Vanadium Sputtering Target is produced by melting technology. Because vanadium oxide has very special optical and electric properties, it can be applied for Infrared intelligent window, electro-optic switch device, and as laser protection materials and stealth material. With up to 3N purity and special annealing treatment, uniform grain size as well as lower gas content, end user can obtain constant erosion rates and high pure and homogeneous thin film coating during PVD process.
The picture below are two micrographs of our vanadium sputtering target, the average grain size＜100μm.
Chemical Specification:
Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. The form below is a typical certificate of 99.9% pure Vanadium Sputtering Target:
Related Sputtering Materials
NiV7 sputtering target
CoFeV sputtering target
FeV sputtering target
VCr sputtering target
VTiZr sputtering target
V2O5 sputtering target
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