roll to roll PECVD system for graphene film production

Plasma Enhanced Roll to Roll Chemical Vapor Deposition Sytem

Main feature                         

Ø Under the vacuum condition , a RF power supply acts on the rare gas in the vacuum chamber to form the plasma equivalent glow effect ( PECVD patent of our company ) , and the field energy of the plasma replaces the thermal energy , so that the growth temperature of the graphene is reduced , and the process conditions are improved .

Ø Achieve growth of high quality graphene thin films by controlling nucleation and growth of graphene

Ø In this method, copper foil is used as a base, motor drives copper foil to move under closed growth condition, and then it passes through the first temperature zone (annealed area). Graphene will deposit on the copper foil on the second, third temperature zone (growth area)and tighten to the roll by the cooling device  

Ø With the advantages of rapid cooling and continuous growth, and can be used for large-scale growth of graphene with large area and high quality.