GaAs EPI Wafer

GaAs EPI Wafer photo-1
Negotiable MOQ: 25 Pieces (Price negotiable depending on order volume and customization)
Key Specifications
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Place of Origin:
Taiwan, China
Brand Name:
GaAs EPI Wafer
Payment & Shipping
Payment Methods:
Port of Shipment:
Taipei
Delivery Detail:
Delivery time depends on order quantity.
Place of Origin Taiwan, China
Brand Name GaAs EPI Wafer

Specifications

1. GaAs EPI wafer for LED/IR
2. Growth Method MOCVD
3. GaAs wafer for Wireless Networking
4. GaAs EPI wafer for LD/PD

1.      Description

This spec is apply to MOCVD process .

Product - AlGaInP MOCVD EPI Wafer

2.      Spec

2.1  EPI Wafer Size

Growth

MOCVD

Diameter

2”

2.2  EPI Wafer Structure

High-Dopant p-GaP level

100 – 300nm

p-GaP Window level

6 – 12um

Emitting Area

AlGaInP

DBR

DBR

Substrate

n-GaAs 350um

 

2.3  EPI Wafer Parameter

Item

Unit

Red

Yellow

Yellow/Green

Description

 

Wave Length (λD)

nm

620 ~ 630

587 ~ 592

568 ~ 573

IF =20mA

 

VF

V

< 2.2

< 2.2

< 2.2

Forward Voltage

 

 

(Iv)

mcd

F

70 – 80

F

60-70

F

10 – 15

IF =20mA

 

G

80 – 90

G

70 – 80

G

15 – 20

 

H

90 – 100

H

80 – 90

H

20 – 25

 

I

100 – 110

I

90 – 100

I

30 – 35

 

J

110 – 120

J

100 – 110

J

35 – 40

 

K

120 – 130

K

> 110

K

40 – 45

 

L

130 – 140

 

 

L

> 45

 

M

> 140

 

 

 

 

                               

Notes

  • Wave Length and Luminous intensity can be changed by customer request.
  • Luminous intensity data is based on the chip size test result that made from EPI Wafer,Red Led is base on 12×12mil2,Yellow and Yellow/Green Led are base on 8×8mil2 .The real electronic performance will be fully relied on chip process.

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Business Type
Manufacturer, Trading Company, Agent
Year Established
1998
Factory Size
10,000-30,000 square meters
Total Employees
11 - 50 People

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