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Help CenterVacuum Radio Frequency Plasma Cleaning Equipment
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Plasma cleaning equipment prepares product surfaces through activation, cleaning, etching, and photoresist removal. This process enhances surface wettability, improves adhesion for coating, plating, and bonding operations, and effectively removes contaminants such as oils and organic residues.
◇◇ Overview ◇◇
It provides reliable surface pretreatment for critical processes including printing, coating, lamination, and encapsulation, while addressing common issues like poor adhesion, uneven coating, and weak bonding. Furthermore, plasma cleaning offers an eco-friendly, efficient, and controllable dry alternative to traditional solvent-based cleaning methods.
◇◇ Features ◇◇
The operating temperature is close to room temperature (usually
Capable of cleaning pollutants (≤0.1nm level) that are beyond the range of traditional wet cleaning methods.
Dry processing does not require chemical solvents, reducing waste liquid pollution; it supports inert or reactive gases, without toxic by-products.
Intelligent control and traceable production information.
◇◇ Technical Specifications ◇◇
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