Si Target

Si Target photo-1
Negotiable MOQ: 1 Piece (Price negotiable depending on order volume and customization)
Key Specifications
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Place of Origin:
China
Shape:
rotating target
Application:
Low-E coated glass, thin film solar cell electrode film, TFT-LCD, semiconductor electronics
Payment & Shipping
Payment Methods:
Port of Shipment:
Guangzhou, Beijing, Shanghai
Delivery Detail:
7 days
Place of Origin China
Shape rotating target
Application Low-E coated glass, thin film solar cell electrode film, TFT-LCD, semiconductor electronics
Chemical Composition Si
Dimensions customer requirements
Material Si

Purity: 99.99%

Density: ≥ 2.2

Impurity content: Fe + Al + Ca: ≤ 50

B:≤5100

O:≤2000

N:≤500

Total impurities: ≤ 100

Resistivity: ≤ 10 Ω. Cm

Size: According to the customer's requests


Application:

mainly used for Low-E coated glass, thin film solar cell electrode film, TFT-LCD, semiconductor electronics, etc.


Product Tags: Si Target , sputtering , sputtering target

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Verified Business License
Business Type
Manufacturer
Year Established
2010
Annual Export Value
US$1.5 Million - US$2.5 Million
Port of Shipment
Shanghai, Guangzhou, Chongqing, Beijing