AlSi Target
Using plasma as heat source, Si + Al powder was heated to molten or semi molten state by a certain atmosphere protection device in atmospheric environment, and then compact coating was formed by high-speed impact on the surface of back pipe, so as to get high-purity, low oxygen content and high density sial target.
Purity: 99.999%
Aluminum content: 8-10%
Fe:≤350ppm
Ca:≤50ppm
Cu:≤50ppm
Mg:≤20ppm
Ni:≤20ppm
O:≤6000ppm
N:≤500ppm
Size: Φ 254 × 12mm or customers requirement
Density: 2.7g/cm3
Melting point: 660 ℃
Resistivity: ≤ 50 (m Ω. Cm)
Back pipe material: 304 / 316L stainless steel (non magnetic)
Application:
SiO2 film and Si3N4 film
Optical glass AR film
Low-E coated glass
Semiconductor electronic components
TFT-LCD
Flat panel display, touch screen glass
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