Deposit Thin Films or Grow Nano-wire Used PECVD Furnace System With 4 MFCS and the Vacuum System
deposit thin films or grow nano-wire used PECVD furnace system with 4 MFCS and the vacuum system
- Lower temperature processing compared to conventional CVD.
- Film stress can be controlled by high/low frequency mixing techniques.
- Control over stoichiometry via process conditions.
- Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.
Specification of the PECVD system
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Split Tube furnace
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Plasma RF Power Supply |
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Anti-corrosive Pressure Gauge |
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Vacuum Pump and valve
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Mass Flow meters |
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Overall dimensions |
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Warranty |
One year limited warranty |
Detailed photos of the PECVD system:
PECVD System with sliding tube furnace for fast heating & cooling.
sliding tube furnace
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