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Help CenterHigh-Purity Graphite Crucible, 99.9% Carbon, for Semiconductor/Metal Melting/Lab Use, High Temp Resistance (3000°C), Custom Sizes
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High-Purity Graphite Crucible is engineered for extreme thermal and chemical stability, with 99.9% carbon content and ultra-low impurity levels. Designed for high-temperature applications (up to 3000°C in inert gas), it is widely used in semiconductor processing, metal melting, and laboratory research.
Material & Properties:
Ultra-High Purity: ≥99.9% carbon, minimal ash (
Thermal Resistance: Withstands 3000°C in inert atmospheres (e.g., argon), 500°C in air (with anti-oxidation coating optional).
Chemical Inertness: Resists acids, alkalis, and molten metals (e.g., gold, silicon, aluminum).
Applications:
Semiconductor: Crystal growth (GaAs, SiC), CVD/PVD processes.
Metallurgy: Melting gold, silver, copper, and rare earth metals.
Laboratory: High-purity sample analysis, chemical reactors.
Energy: Lithium battery material synthesis, solar cell production.
Available Options:
Sizes: Inner diameter 10mm–500mm (customizable).
Wall Thickness: Standard 5mm–20mm (adjustable for thermal efficiency).
Machining: Precision-turned, threaded, or grooved designs.
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