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Fully automatic On-Line AP plasma processing system CRF-APO-500W-XN
Name
Fully automatic On-Line AP plasma processing system
Model (Model)
CRF-APO-500W-XN
Power supply
380V/AC, 50/60Hz
Plasma power
10KW (Max)/40KHz (Option)
Effective processing width
120mm-1200mm (Option)
Effective processing height (Processing height)
3mm~8mm (Max)
Processing speed
0-8m/min
Working gas (Gas)
N2/N2+CDA
Product features: Built-in cooling system to improve and ensure the service life and performance of the equipment;
Flexible On-Line installation method, the energy of electrons and ions can reach more than 10eV,
The efficiency of batch processing of materials can be more than 10 times higher than that of low-pressure glow discharge devices.
Scope of application: applied to surface treatment of FPC & PCB surface treatment, composite materials, glass, ITO and other industries.
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