Plasma Cleaning Device
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shaobo@sfi-crf.com
Fully automatic On-Line AP plasma processing system CRF-APS-500W
Model (Model)
CRF-APS-500W
Power supply
220V/AC, 50/60Hz
Power (Power)
1000W(Max)/13.56MHz
Effective processing width
120mm-2000mm(Option)
Effective processing height (Processing height)
1mm-3mm(Max)
Processing speed
0-5m/min
Working gas (Gas)
AR+O2
Product features: low temperature treatment process, the treatment temperature can be
Built-in cooling system to improve and ensure the service life and performance of the equipment;
Flexible On-Line installation method, the energy of electrons and ions can reach more than 10eV, and the efficiency of batch processing of materials can be more than 10 times higher than that of low-pressure glow discharge devices.
Scope of application: applied to the surface treatment of FPC&PCB surface treatment, composite materials, glass, ITO and other industries;
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