GSL-1100X-SPC-12H plasma heating type thin film sputtering apparatus

Brief introduction

GSL-1100X-SPC-12HPlasma heating type thin film sputtering apparatusSpecifically for the base metal film plated (such as gold, platinum, indium, silver, etc.), the largest diameter of sample size40mmThe film thickness can be up to300a., especially suitable forSEMGold plated sample as conductive pole.

Features

1,withThere are2L/sTwin twist mechanical pump, the outlet is equipped with vertical oil mist filter, filter vacuum pump work when the lampblack, reduce the loss of the pump protection ring

Environment and human health.

2 has CE Certification.

Technical parameter

1, the input power supply:208V-240V 50Hz/60Hz <3000W

2, quartz cavity:Ø100mmx130mm

3And the sample:Ø60mm, can be heated to a height adjustable600℃

4, the thermostat (s) :30Period of programmable temperature controller, temperature control precision is plus or minus1℃

5And heating rate:15℃/min(recommended)

6And target material: for purity4NtheGold target,Ø57mmx0.12mm

7,Air intake: equipped with stainless steel needle valve, ventilation with argon gas, can achieve better plasma coating