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Nickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin Film

Nickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin Film photo-1
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Nickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin Film photo-3
US$ 150,000 - 300,000 MOQ: 1 Set
Key Specifications
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Condition:
New
Place of Origin:
Shanghai, China
Brand Name:
vakia
Payment & Shipping
Payment Methods:
Port of Shipment:
Shanghai
Delivery Detail:
Delivery time depends on order quantity.
Condition New
Place of Origin Shanghai, China
Brand Name vakia
Model Number MSC1215
Voltage 380V
Power(W) 90kw
Dimension(L*W*H) 4x5x3M
Weight 5 tons
Certification ISO9001:2008
Warranty 1 year
After-sales Service Provided Engineers available to service machinery overseas

 

 

As the serious pollution of air, water caused by chemical material during the surface treatment, the eletroplating method is urgently need to be replaced by an advanced coating technology. 

 

PVD magnetron sputtering coating is used for Nano thin films generation. Metal film, conductive film, non-conductive film etc. are all possible with sputtering technology, which represents a real alternative of electroplating due to its  free hazard and 100% environment friendly. 

 

PVD sputtering gives a combination of advantages like no other:

  • It is totally economically efficient generating the thinnest and most uniform coating films; 
  • It is a dry coating process at low temperature in a vacuum chamber; 
  • It offers great versatility, can be used for the deposition of conductive or non-conductive materials on any 
  • type of substrates, like: metals, ceramics, plastic materials. 
  • Multi layers coating are available.  

The MSC-1215 is designed for thin conductive film's coating on cell phones, communication tools, computers etc. eletronics components. 

 

 

Sputtering Materials for conductive  films:  Cu (Copper), Ni (Nickel), Ag (silver) based on different coating recipes and coating processes requirement. 

 

Substrate: metal, plastic, ceramic  etc. 

 

Nickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin FilmNickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin Film

 

Nickel Conductive Film Coating, Nickel Sputtering Metallization, PVD Ni Conductive Thin Film 

                                                                    Vakia-MSC PVD Sputtering Coating Plant

Model

MSC-800

MSC-900

MSC-1008

MSC-1250

MSC-1400

MSC-1600

Chamber Inner size(mm)

800x800

900x900

1000x800

1250x1250

1400x1600

1600x1600

Power Supplies

Pulsed bias supply, DC power supply, MF power supply, RFmagnetron supply

Chamber Type 

Vertical cylindrical model, double doors/single door

Chamber Material

SUS304

Ultimate Vacuum

6.0×10-4Pa

Vacuum Evacuation

From  1 atmosphere to 8.0×10-3Pa≤10min

Vacuum Pump System

diffusion pump/ molecular pump+ roots pump + mechanical pump + holding

 pump 

Sputtering Sources

Sputtering targets 

magnetron 

power supply

10KW/unit

20KW/unit

20KW/unit

30KW/unit

40KW/unit

50KW/unit

Driving System

planetary driving, central driving

Cooling

 Cooling water, with cooling tower or cryopump, Polycold assisted facilities

Operation System

manual / automatic , touch screen , PLC or IPC system

 

 

 

 

Please contact us for more information, Vakia Vacuum Coating is honored to be your your business partner.    

 

 

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Business Type
Manufacturer, Trading Company
Year Established
2009
Factory Size
Above 100,000 square meters
Total Employees
51 - 100 People