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PECVD System for Synthesis of Silica Nanowires , PECVD Equipment

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US$ 5,090 - 25,980 MOQ: 1 Set
Key Specifications
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Brand Name:
CYKY
Model Number:
CYKY-PECVD
Place of Origin:
Henan, China
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Zhengzhou CY Scientific Instrument Co., Ltd.
Payment & Shipping
Payment Methods:
Port of Shipment:
China port
Delivery Detail:
Delivery time depends on order quantity.

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Brand Name CYKY
Model Number CYKY-PECVD
Place of Origin Henan, China

plasma enhanced cvd tube furnaces (PECVD) equipment

 

Brief introduction of the PECVD system:
CYKY-PECVD  is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source,   split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump.   The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nano-wire from a gas state (vapor) to a solid state, and  it Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Specification of the PECVD system 

  Split Tube furnace


 
  • 1200oC Max. working temperature for < 60 minutes
  • 1100oC Max for continuous heating
  • 30 segments programmable precision digital temperature controller
  • 440 mm length single heating zone and 150 mm length constant temperate zoneHigh purity quartz tube optional from ( click optional bar to choose )
  • One pair of vacuum sealed flange with valves
    • 2"OD x 1.7"ID x  48" Length 
    • 3.14"OD x 2.83"ID x 48'' Length
  • Input power: 208 – 240V AC input, single phase at max. 4KW
  • Two zone split tube furnace  is optional at extra cost
Plasma RF Power Supply

     
  • Output Power:          5 -500W adjustable with ± 1% stability
  • RF frequency:          13.56 MHz ±0.005% stability
  • Reflection Power:     200W max.
  • Matching:                Automatic
  • RF Output Port:       50 Ω, N-type, female
  • Noise:                    <50 dB. 
  • Cooling:                  Air cooling.
  • Power :                   208-240VAC, 50/60Hz
  • Note:                      This RF power supply can accept 50 - 80 mm Max. quartz tube  by changing flange
Anti-corrosive Pressure Gauge
  • 3.8x10-5 to 1125 Torr measurement range
  • Anti-corrosive, gas-type independent 
  Vacuum Pump and valve
 
  • Heavy Duty Rotary Vane Vacuum Pump with Two Stage Exhaust Systeminstalled in bottom case with max. vacuum pressure 10-2 torr.
  •  KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve
  •  Digital vacuum pressure gauge and display are installed with the furnace
Mass Flow meters
     
  • Four precision mass flow meters (0.02% accuracy) with digital display are installed on the bottom case to control gas flow rate automatically.
  • MFC 1: Gas flow range from 0~100 sccm
  • MFC 2&3: Control range from 0~200 sccm  
  • MFC 4: Control range from 0~500 sccm
  • One gas mixing tank is installed on bottom case with liquid release valve
  • 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually
  • Gas inlet fitting: four 1/4NPS
  • Gas outlet fitting: four 1/4NPS
Overall dimensions
  • Furnace: 550mm(L) x 380mm(W) x 520mm(H) 
  • 2 Bottom Mobile case together: 1200mm(L) x 1200mm(W) x 1200mm(H)
  • Net weight: 220 lbs
  • Shipping weight: 350 lbs
Warranty 
 One year limited warranty

 

Detailed photos of the PECVD system:

         PECVD System for Synthesis of silica nanowires , PECVD equipment

PECVD System for Synthesis of silica nanowires , PECVD equipmentPECVD System for Synthesis of silica nanowires , PECVD equipment

 

PECVD System with sliding tube furnace for fast heating & cooling.

PECVD System for Synthesis of silica nanowires , PECVD equipment

 

sliding tube furnace

PECVD System for Synthesis of silica nanowires , PECVD equipment

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Zhengzhou CY Scientific Instrument Co., Ltd.
Business Type
Manufacturer, Trading Company
Year Established
2013
Factory Size
1,000-3,000 square meters
Total Employees
11 - 50 People
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