high purity W sputtering target used for industry

Specifications

1.Purity:>=99.9%
2.Density:19.4g/cm3
3 Surface: Bright, Polish
4 MOQ:10 pcs
5 Dimensions: as customers' request

Our Advantage

 

1. No.1 in China

2. Capacity 10,000pcs/year

3. The most popular planar targets: NiCr alloy, Cr, Ti, SS, Sn, Cu, Si, etc.

4. The most popular rotary targets:  SiAl, TiOx, Sn, ZnAl, ZnSn, ZnSnSb,Ti, SS, Cr, Nb and AZO etc. 

 

Item Name	High purity  tungsten target 3N
Purity	>=99.9%
Density	19.4g/cm3
Shape	Planar/Rotary target, according to your request
Certificates	ISO9001:2008, SGS, CO
MOQ	Over 10 pcs
Application	Widely used in coating processing industries A: Architectural and Automotive Glass, WEB Coating B: The Flat Panel Display Industry C: Solar Photovoltaic & Solar Heating. D: Optical communication & Optical Storage.

 

All the sizes can be manufactured based on customer’s requirements

You can get more information about our company and products on our website: