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Help CenterHigh Purity Quartz Glass Crucible for the Semiconductor Industry
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Specifications
High purity quartz glass crucible for the semiconductor industrySemi-transparent quartz glass crucible of arc melting used for semiconductor industry is the essential basic material for pulling monocrystalline silicon and developing L S I circuit. At present, the small transparent quartz crucibles have been replayed by this kind of crucibles in developed countries. It has the advantages of high purity, high temperature resistance, with big size, good thermal insulation, economization on energy, quality stability etc. In China only our company produced the crucible with imported equipment. The high pure graphite used in arc crucible of our company is produced with introduced from Japan techniques, ash content less than 80 PPm, is the unique in China.
Type |
Al |
Fe |
Ca |
Cu |
K |
Na |
Li |
B |
OH |
DHS |
20 |
1 |
1.5 |
0.1 |
3 |
3 |
3 |
0.3 |
30 |
DHS-A |
15 |
0.3 |
0.6 |
0.05 |
0.7 |
1.0 |
0.7 |
<0.1 |
30 |
DHS-B |
8 |
0.2 |
0.6 |
0.02 |
0.3 |
0.9 |
0.2 |
<0.05 |
30 |
Typical sizes:
Crucible size |
Outside dia |
Height |
Thickness |
R* |
r* |
||
t1 |
t2 |
t3 |
|||||
8 |
203±0/3 |
153±3 |
5.5±1.5 |
3 |
8.5 |
305 |
30 |
10 |
254±2 |
178±3 |
6.0±1.5 |
3.5 |
9 |
305 |
70 |
12 |
305±2 |
228±3 |
6.5±1.5 |
4 |
9.5 |
305 |
80 |
14 |
355±2 |
254±3 |
7.5±1.5 |
5 |
10.5 |
400 |
90 |
16 |
404±2 |
305±3 |
8.5±1.5 |
6 |
11.5 |
400 |
90 |
18 |
457±2 |
355±3 |
8.5±1.5 |
6 |
11.5 |
500 |
120 |
20 |
508±4 |
381±3 |
6 |
6 |
11.0 |
500 |
120 |
22 |
558±4.5 |
381±3 |
7 |
7 |
11.0 |
558 |
89 |
24 |
610±4.5 |
381±3 |
7±1 |
7±1 |
11.0 |
610 |
89 |
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