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Help CenterPure Rhenium (Re) Sputtering Target,Re Targets, Re Metals, 99.99% High Purity, Custom Size,Rhenium Sputtering Target ,Re Metal Sputtering Target
Product Spotlights
2/ Extreme melting point 3180 °C — excellent thermal stability.
3/ High density — dense microstructure, stable sputtering rate & uniform film thickness.
4/ Full customization — diameter 25–300 mm, thickness 1–12 mm, shape customized, backing plate bonding.
5/ Stable thin film properties — high conductivity.
6/ Reliable supply for R&D to production scale — MOQ flexible.
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High Purity Indium (In) Sputtering Target 99.99%–99.999% | Planar & Rotary, Custom Size, Elastomer Bonding Available/ Indium Metal Sputtering TargetNegotiableMOQ: 1 Piece -
Pure Rhenium (Re) Sputtering Target,Re Targets, Re Metals, 99.99% High Purity, Custom Size,Rhenium Sputtering Target ,Re Metal Sputtering TargetNegotiableMOQ: 1 Piece
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Rhenium Target 99.95% Purity Re Rhenium Sputtering Targets Customize SizeNegotiableMOQ: 1 Piece
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Rhenium TargetNegotiableMOQ: 1 Piece
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Rhenium Plate/Sheet/TargetUS$ 500 - 1,500MOQ: 2 Kilograms
Product Parameter
Typical Value / Range
Material: Pure Rhenium (Re)
CAS No.: 7440-15-5
Purity: 99.9%–99.99% (3N–4N)
Density≥ 21.0 g/cm³ (theoretical 21.02 g/cm³)
Melting Point：3180 °C
Electrical Resistivity：19.3 μΩ·cm @ 20 °C
Thermal Conductivity：0.480 W/cm/K @ 25 °C
Shape：Disc / Round / Rectangular / Planar / Custom
Diameter：25–300 mm (customizable)
Thickness：1–12 mm (customizable)
Backing Plate：Cu / Ti / In bonding (optional)
Manufacturing Process：Powder metallurgy process + Rolling
Sputtering Method：DC / RF Magnetron Sputtering
Surface：Machined, clean, oxide-free
Packaging：Vacuum sealed
Product Description
Our Pure Rhenium (Re) Sputtering Targets are manufactured from high-purity rhenium (99.9%–99.99%) by powder metallurgy process and Rolling, delivering a dense, uniform microstructure with ultra-low porosity. With an extreme melting point of 3180 °C, density of 21.02 g/cm³, and excellent electrical conductivity, rhenium targets are ideal for depositing high-performance thin films in the most demanding environments.
These targets are fully compatible with DC and RF magnetron sputtering systems and can be supplied in discs, plates, or custom geometries with diameters from 25 to 300 mm and thicknesses from 1 to 12 mm. Optional Cu/Ti/In backing plate bonding is available for enhanced thermal management.
Rhenium thin films offer outstanding high-temperature stability and electrical conductivity, making them the material of choice for semiconductor metallization, aerospace high-temperature coatings, superconducting quantum devices, energy catalysis, and advanced optical coatings.
We also supply Mo-Re and W-Re alloy sputtering targets with customized compositions (e.g., Mo-41%Re, Mo-47.5%Re,W-25%Re,W-5%Re) to meet specific thin-film requirements.
All products are supplied with full COA, dimensional inspection report, and customized packaging for global shipment.
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