- Ultra Minor Metal Ltd
-
Changsha, Hunan, China
- Main products: High purity tungsten powder, Precious metal, Sputtering target, MOCVD, Tungsten, molybdenum, tantalum, niobium and titanium
Home > Products > High-quality optoelectronic material > 99.999% high purity tungsten target,5N Tungsten sputtering target
99.999% high purity tungsten target,5N Tungsten sputtering target
- 100 Piece / Pieces per Month
- chagnsha,shanghai
- T/T PayPal
- 30 days
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Product Details
| Place of Origin | China | Shape | round | |
| Application | High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells. | Chemical Composition | 99.99%-99.999% | |
| Dimensions | Diameter 150～350 Thickness 6～25 | Material | w |
Product Description
Application:
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
Specification:
Name | Molecular formula | Specification | Size | Relative density | Grain size | Defect rate | |
| Tungsten target | W | 4N（99.99%） | Inch | mm | ≥99% | ≯50µm | 0 |
5N（99.999%） | D（6,8,10,12） H（0.25,0.5,0.75） | Diameter 150～350 Thickness 6～25 | |||||
≥99% | ≯50µm | 0 | |||||
Contact Us
- Ultra Minor Metal Ltd
- Contact nameApple Chat Now
- Phone86-731-88590095
- AddressRm.101,Bldg.10, Xinggong Science and Technology Park, No.100 Luyun Rd.,Changsha High-tech Industrial Development Zone,, Changsha, Hunan
Product Categories
| High-quality optoelectronic material | Precious metal | Spherical | Nano powder | Rare metals |
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