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1.Grade: RO5200, RO5400, RO5252 (Ta-2.5W), RO5255 (Ta-10W)
2.Standard: ASTM B521-98, GB/T14841, ASTMB365, ASTMB708, ASTM B364-92
3.Purity:≥ 99.95% or 99.9%
4.Generally Size:
Width: 30-1000mm
Thickness: 0.07-10mm
Length: 300mm-3000mm
5.Characteristic:
Density: 16.6 g/cm3
Certificate: ISO9001:2008
6.Application:
Used in laboratory equipment.
Used as a substitute for platinum.
Used in manufacturing superalloys and electron-beam melting.
Used in metallurgical, machinery processing, glass, and ceramic industries.
Used as a superalloy additive in nickel-based alloys.
Used for sputtering targets.
Used for artificial ears
Used to make glass or metal seal
Technical parameters
Strict quality control system
--- Each link of the production will be strickly controled, ensuring without one unqualified product being out from our company.
Products :plate, bar, wire, disc, tube, foil ,target,boat ,strip and so on.
Supply tantalum crucible which quality as well as functions has been proved by a scrupulous test.High quality+ Best price
Recommend size
| Form |
Thickness, Dia., Wall inches (mm) |
Width, Length inches (mm) |
| Tantalum Foil |
0.001“ to 0.005“ (0.025 to 0.1270 mm) |
12“ maximum width x coil (30.5 mm max. width x coil) |
| Tantalum Sheet |
0.005“ to 0.020“ (0.1270 to 0.50 mm) |
36“ maximum width x coil (915 mm max. width x coil) |
| Tantalum Sheet |
0.015“ to 0.060“ (0.380 to 1.524 mm) |
40“ width x coil (1000 mm width x coil) |
| Tantalum Round Disk |
Thickness: 0.060" to 0.125" (1.524 to 3.175 mm) |
Up to 37 in diameter |
| Tantalum Plate |
0.060“ to 0.125“ (1.524 to 3.175 mm) |
width not to exceed 40“ (1000 mm) |
Grade(UNS) |
Annealed |
||
Tensile strength min, psi (MPa) |
Yield strength min,psi (MPa)(2%) |
Elongation min, % (1 inch gage length) |
|
Pure Ta (RO5200, RO5400) |
30000 (207) |
20000 (138) |
20 |
Ta-10W (RO5255) |
70000 (482) |
60000 (414) |
15 |
Ta-2.5W (RO5252) |
40000 (276) |
30000 (207) |
20 |
Ta-40Nb (RO5240) |
35000 (241) |
20000 (138) |
25 |
Chemistry % | |||||||||||||
Designation |
Chief component |
Impurities maxmium |
|||||||||||
Ta |
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
Nb |
O |
C |
H |
N |
|
Ta1 |
Remainder |
0.005 |
0.003 |
0.002 |
0.006 |
0.006 |
0.002 |
0.04 |
0.015 |
0.005 |
0.0015 |
0.006 |
|
Ta2 |
Remainder |
0.01 |
0.01 |
0.005 |
0.02 |
0.02 |
0.005 |
0.08 |
0.02 |
0.01 |
0.0015 |
0.01 |
|
TaNb3 |
Remainder |
3.5 |
0.01 |
0.01 |
0.005 |
0.02 |
0.02 |
0.005 |
0.02 |
0.01 |
0.0015 |
0.01 |
|
TaNb20 |
Remainder |
17.0-23.0 |
0.01 |
0.01 |
0.005 |
0.02 |
0.02 |
0.005 |
0.02 |
0.01 |
0.0015 |
0.01 |
|
Ta2.5W |
Remainder |
0.005 |
0.003 |
0.002 |
3.0 |
0.006 |
0.002 |
0.04 |
0.015 |
0.005 |
0.0015 |
0.006 |
|
Ta10W |
Remainder |
0.005 |
0.003 |
0.002 |
11 |
0.006 |
0.002 |
0.04 |
0.015 |
0.005 |
0.0015 |
0.006 |
|
Tantalum and Tantalum Alloy
R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both
R05400, unalloyed tantalum, powder-metallurgy consolidation.
R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace of vacuum-arc melt, or both.
R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both.
R05240, tantalum alloy, 60 % tantalum, 40 % niobium, electron-beam furnace or vacuum-arc melt.
Advantage
Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such as electronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation.
Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such as electronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation.
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