LHD012 Vacuum hot pressing furnace

Brief introduction

Vacuum hot pressing furnace OTF-1200X-VHP4 is an ideal tool for the preparation of dense compound materials under high pressure vacuum pressure, and can be bonded to a multilayer substrate under 5T pressure. The machine can be heated to 1100 degrees Celsius, and has 30 sections of temperature control procedures.

Features

1, in order to reduce the heat radiation and achieve the effect of rapid cooling, the heating element is embedded in the water cooling mechanism.

2, cling to the top of the heating element is arranged on the nitride aluminum substrate (o 76mm x 0.5mm), the sample based on more uniform temperature.

3, graphite crucible 3 "can be placed on the bottom of the heating element, used for evaporation material.

4, vacuum flange through the two silica gel O ring for sealing, through the mechanical pump of the vacuum degree can be up to 10-2torr, through the molecular pump vacuum degree can be up to 10-5

Torr.

Two, 5 Vacuum flanges can be moved up and down through the manual operation.

6, a digital vacuum display meter installed at the top of the flange, you can accurately measure the degree of vacuum inside the cavity.

Technical parameter

1, power supply: single phase AC208V-240V (need 20A air switch)

2, vacuum cavity: high purity quartz tube, outside diameter 280mm, diameter 275mm, high 229mm

3, heating elements: two groups of IR infrared tubes, rated power 800W, total power 1600W

4, thermocouple: S type thermocouple 2, respectively, installed in the upper and lower flanges

5, working temperature: the highest temperature less than two heating zones working alone 650 DEG C, two heating area of the maximum temperature difference is less than or equal to 350 DEG C

6, heating rate: >8℃/s

7, cooling rate: >10℃/s(600℃-100℃)

8, vacuum flange: 316 stainless steel, equipped with 1 KF-25 interface, 2 1/4 "hose connector

9, vacuum gauge: digital vacuum display

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