Mild Acidic Etch for High Finish Aluminum
DEUTEQ ACTEQ 322
Mild Acidic Etch for High Finish Aluminum
Introduction
1. Use in the pre-treatment cycle of aluminum alloys prior to electroless nickel plating.
2. Particularly suited for preparing aluminum in high technology applications such as computer memory disks.
3. Especially effective on difficult-to-plate alloys, particularly those rich in magnesium (e.g. 5086, 5052 alloys). Contains no chelates.
4. Minimizes the possibility of cross contamination of other solutions due to drag-in.
Operation Conditions
DEUTEQ ACTEQ 322 20% volume
Temperature 45-70 °C (Optimum is 63°C)
Time 1-3 min as required
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