Rare Earth Coating Material Erbium 99.9% Er Sputtering Target
Product Description of Er sputtering target
Item Name | High purity Erbium target 99.9% rare earth Er sputtering target 3N |
Purity | 99.9% |
Shape | Round/square target, according to your request |
Available size | Round: dia 25~150mm,Thickness:3~10mm Rectangular: Length up to 2000mm Customization is available |
Certificates | ISO9001:2008, SGS, The third test report |
Technics | Hot Isostatic Pressing (HIP), Powder Metallurgy, Patented thermo-mechanical process |
Application | Widely used in coating processing industries A: Magnetic Data Storage Application B: Electronic and Semiconductor Application. C: used in purification and inoculant. etc. |
Advantages | Microstructure: Uniform equiaxed fine grain, consistent microstructure, average grain size <100μm |
Detailed information | In petroleum chemical industry Erbium can be used as a catalyst, also applied to purification and inoculan, and there is a very good prospect in ceramic material. |
Our Main Products:
High Purity Metal: Al, Ag, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and evaporation material.
Precious Metal: Au, Ag, Pt, Pd, Ru, Rh, Re and Ir
Ceramic targets: Nb2O5, Ta2O5, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X
Loyaltarget is a leading manufacturer of high purity metal materials and PVD thin film materials in China with more than 10 years experience. Our company specializes in thin film coating materials, including high purity metals, sputtering targets and evaporation materials.
Our products covers various fields, including PVD thin film, thermal evaporation, solar cell, semiconductor, high-entropy alloy, optronics, etc.
Loyaltarget is committed to provide our clients highly individualized solutions at an optimized budget.
Janice Guan
Beijing Loyaltarget Technology Co, Limited
janice.guan@loyaltarget.com
Tel: +86 10 6292 6252
www.loyaltarget.com
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