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Home > Manufacturing & Processing Machinery > Metallic Processing Machinery > Metal Processing Machinery Parts > GSL-1100X-SPC16-3 3 Targets Plasma Sputtering Coater

GSL-1100X-SPC16-3 3 Targets Plasma Sputtering Coater

US$ 9 - 9,999 MOQ: 1 Set

Key Specifications

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Business Type:

Manufacturer, Trading Company

Year Established:

2001

Factory Size:

10,000-30,000 square meters

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Laizhou Weiyi Experimental Machinery Manufacture Co., Ltd.

Payment & Shipping

Payment Methods:

Port of Shipment:

qingdao

Delivery Detail:

Delivery time depends on order quantity.

Product Details
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Product Description

Model:	GSL1100X-SPC16-3 3 Targets Plasma Sputtering Coater
Brief Introduction:	GSL1100X-SPC16-3 3 Targets Plasma Sputtering Coater is a CE certified compact plasma sputtering coater. This machine is basic on dipolar (DC)sputtering principle designed, it's a sample, reliable, low cost coating equipment. It's special because it has 3 targets in the vacuum chamber. Rotary sample board, can coating three kinds of materials on the same sample in turn. Suit for manufacture all kinds of complex film sample in the laboratory, also can make the non-conductor material testing electrode.
Main Feature:	1. Sample sputtering chamber vacuum gauge and sputtering ampere meter, to indicate and monitor instrument condition 2. Sputtering current adjustable controller, micro vacuum gas valve. When working combine with the internal automatic control circuit can easily control the pressure in the vacuum chamber, ionization current and arbitrary select the required ionized gas, to obtain the best coating effect. 3. Particular designed bell edge rubber seal ring, can make sure to have a long term usage and can't appear the "brokenedge"phenomenon to effect the sample sputtering chamber vacuum degree; 4. Ceramic seal high pressure head is more durable than the rubber seal. 5. According to gas ionization character in the electric field, using the high-capacity sample sputtering chamber and corresponding area sputtering target, to make the coating film more uniform and pure.
Technical Parameter:	1. Target(upper electrode):Diameter:45mm, Thickness:0.12mm 2. Vacuum specimen chamber:Diameter:160mm, Height:120mm 3. Sputtering area:45mm, three areas 4. Vacuum gauge:Max. vacuum degree:≤4X10-2 mbar 5. Plasma ampere meter:Max. current:50mA 6. Timer:Longest time:900S 7. Compact vacuum valve:can connect withφ3mm flexible tube 8. Allowed gas:all kinds 9. Max. voltage:-1600(-3000)DCV 10. Mechanical pump:2L/S
Optional Accessories :	All kinds of target materials