Tungsten Sputtering Targets
Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc..
The Tungsten Sputtering Target we can provide is as follows:
Target weight:≤200kg/pc, Purity:≥99.95%.
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