High Vacuum Ion Coating Machine
Specifications
1.Decorative coating2.ISO9001
Specification and model |
LD-6C20(A/B) |
Remarks |
Vacuum Chamber Inner Size |
¢800-900×h800-900(mm) |
The size can be increased or decreased±10% |
Effective coating space |
¢700-800×h600-700(mm) |
The size can be increased or decreased±10% |
Workpiece rotary frame |
Revolution+ revolution and rotation |
Design according to the specific requirements |
The layout of the rotary frame |
The top of Vacuum Chamber downward install |
lower , upward install, can instead |
Quantity of the hanging rod |
4 revolution+6-8 revolution and rotation |
Can design according to the workpiece quantity |
Rotary speed |
0-5revolutions/minute(rotation)speed governor adjust |
variable-frequency governor |
The maximum size of the workpiece |
¢150-170×h550-650(mm)rotation |
Hanger quantities and rotation radius |
Application |
Decorative coating |
|
Workpiece material |
Metal, glass, ceramics, plastics etc. |
Almost all material |
Film material |
TiN, CrN, TiC, TiCN, etc. |
Multilayer film, Decorative film |
Requirement of production space |
5×7m |
Leave the space of operation and maintenance |
Requirement of capacitance |
50Hz 380V 60KVA |
Installed capacity not practical power consumptive |
Requirement of cooling water |
more than and equal to 3ton/hour circulating cooling water/ 25°C |
|
Pollutant emission |
none |
None exhaust gas, wastewater, none scrap |
Work noise |
less than and equal to 90decibel |
|
Vacuum air pump |
2X-70rough pump+2X-30maintain pump |
|
Roots pump |
ZJP-150 |
Can increase |
Diffusion pump |
KT-400 |
Can replace molecular pump according to the requirement |
Ultimate vacuum |
Overmatch 6×10-4 Pa |
|
Work vacuum |
6.67×10-3 Pa |
|
Exhaust speed |
less than 20 minutes(atmosphere—work vacuum) |
Normal temperature |
Pressure rising rate(leak rate) |
less than and equal to 0.35Pa/h |
|
Vacuum chamber material |
304stainless steel |
|
Rotary frame material |
6 dynamoelectric striking the arc indirect cooling |
When the equipment upgrades option |
Target size |
¢100×40(mm) |
Selectable configuration |
Magnetron sputtering target |
2(direct cooling) |
|
Sputtering target size |
w100-150×h600-700(mm) |
|
Grid bias power supply |
20KW 20KHz Inverter power supply |
High-end configuration option(Already contains) |
magnetron sputtering power supply |
25KW 40KHz intermediate frequency pulse power source |
Two set |
Voltaic arc power supply |
6 0-200A electric current tunable |
When the equipment upgrades option |
Vacuum chamber heating power |
15-18KW temperature PID adjust |
|
Control mode |
Automatic(A) Manually operation(B) |
Automatic control type have hand control |
Automatic control system (A) |
Industry control computer+ PLC+ LCD+ printer |
Can control by touch screen |
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