Chromium Sputtering Target

Chromium Sputtering Target photo-1
Chromium Sputtering Target photo-2
Chromium Sputtering Target photo-3
US$ 18 - 60 MOQ: 1 Piece
Key Specifications
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Place of Origin:
Shaanxi, China
Brand Name:
OY
Model Number:
chromium sputtering target
Payment & Shipping
Payment Methods:
Port of Shipment:
tianjin shanghai
Delivery Detail:
Delivery time depends on order quantity.
Place of Origin Shaanxi, China
Brand Name OY
Model Number chromium sputtering target
Application industry
Technique polish
Dimensions as your need
Grade chromium
Powder Or Not Not Powder
Ti Content (%) ≥99.5%

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chromium sputtering target

chromium sputtering targetchromium sputtering target

 chromium sputtering target

Item Product name Manufacturing method Product size Relative density
1 Chromium Target hot isostatic pressing(HIP) maximum size1200*250mm >99.0%
2 Titanium Target smelting maximum size500*300mm >98.0%
3 Niobium Target hot isostatic pressing(HIP) maximum size1200*250mm >98.0%
4 Cr-Al Target hot isostatic pressing(HIP) maximum size1200*250mm >98.0%
5 Ti-Al Target hot isostatic pressing(HIP) maximum size1200*250mm >99.0%
6 Si-Al Target hot isostatic pressing(HIP) maximum size1000*200mm >99.0%
7 Cr-Si Target hot isostatic pressing(HIP) maximum size800*180mm >96.0%
8 W-Ti Target hot isostatic pressing(HIP) maximum size800*180mm >99.0%
9 Ni-Cr Target The vacuum melting, forging and rolling maximum size500*300mm >98.0%
10 molybdenum alloy hot isostatic pressing(HIP) maximum size800*180mm >99.0%
11 Tubulose Target hot isostatic pressing(HIP) Length<1.2m,Outside<300mm >96.0%

chromium sputtering target

Item Product name Purity Grain size Conventional proportions Product Advantage
1 Chromium Target 99.5%-99.95%(2N5-3N5) <100μm   High purity, high density, fine and uniform grain size, low oxygen content.
2 Titanium Target 99.5%-99.99%(2N5-4N) <180μm  
3 Niobium Target 99.5%-99.95%(2N5-3N5) <100μm  
4 Cr-Al Target 99.5%-99.95%(2N5-3N5) <100μm Cr-70Al,Cr-50Al,Cr-30Al(at%)
5 Ti-Al Target 99.5%-99.95%(2N5-3N5) <100μm Ti-30Al,Ti-50Al,Ti-67Al,Ti-70Al(at%)
6 Si-Al Target 99.5%-99.95%(2N5-3N5) <50μm Si-10Al,Si-30Al,Si-50Al (wt%)
7 Cr-Si Target 99.5%-99.95%(2N5-3N5) <100μm Cr-50Si(wt%)
8 W-Ti Target 99.5%-99.95%(2N5-3N5) <100μm W-10Ti(wt%)
9 Ni-Cr Target 99.5%-99.99%(2N5-4N) <150μm Ni-20Cr(wt%)
10 molybdenum alloy 99.5%-99.95%(2N5-3N5) <100μm  
11 Tubulose Target 99.5%-99.95%(2N5-3N5) <50μm Cr,Ti,Al,Nb,TiAl,SiAl,Mo alloy,CrAl,NiCr,CrTi,TiSi and so on. Produce large aspect ratio, one-piece tubular target. Compared with planar targets, which has a uniform and fine grain size, high utilization of materials, coatings good continuity, uniform and dense coating composition and so on.

chromium sputtering target

chromium sputtering target

chromium sputtering target

chromium sputtering target

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Business Type
Manufacturer, Trading Company
Year Established
2007
Factory Size
1,000-3,000 square meters
Total Employees
11 - 50 People