Compact Tabletop Plasma Cleaner With Vacuum Pump / Vauum Plasma Cleaner
Specifications
plasma cleanerHigh purity quartz chamber
Low, medium, and high power settings
Easy operating
Different Gas Vacuum Plasma Cleaner
Brief introductin of plasma cleaner
Plasma cleaner is mainly used to pre-clean nanoscale organic contamination on wafer with N2,
Oxygen, air, or mixed gas plasma. The removal rate can reach about 10 nm/min. It is mainly used
for pre-cleaning wafer, metal, semiconductor, high polymer material, etc.
Outstanding features of pasma cleaner
High purity quartz chamber
Low, medium, and high power settings
Easy operation and environmental friendly
Main technical specification of plasma cleaner
Input power |
AC110V~220V for your option |
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RF Power(adjustable) |
Low setting |
716V |
10mA |
7.2W |
Medium setting |
720V |
15 mA |
10.5W |
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High setting |
740V |
40 mA |
30W |
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Plasma Chamber |
6’’ diameter X 6.5’’ length quartz chamber (which can be customized. in to Dia. 3” X6.5’’ Length or Dia.8”X12” Length, etc) Equipped with built-in hinged type front flange |
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Vacuum pump and Valve |
Double stage rotary vane vacuum pump with exhaust filter Max. total pressure of 30 mTorr Needle valve to control gas flow and chamber pressure 3-way valve to quickly switch from bleeding in gas, isolating the chamber and venting |
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Input gas |
Many inert gas can be choosen for plasma cleaning, such as, N2, Ar, Air, and mixed gas (no flammable gas) |
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Optional |
Digital vacuum gauge is used for monitoring chamber pressure accurately Wafer quartz boat |
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Warranty |
One year limited warranty with lifetime support |
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Service:
1,reply your inquiry at the first seconds
2,answer your question sincerely
3,to satisfy your requirement
4,deliver products timely
5,We will offer the tracking No.for checking the status we ship the goods.
Send Inquiry to This Supplier
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