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Home > Manufacturing & Processing Machinery > Chemical Equipment & Machinery > Pressure Vessel > Mo Sputtering Target for Semiconductor Application
Mo Sputtering Target for Semiconductor Application
US$ 120 - 200
MOQ: 10 Kilograms
Key Specifications
Get Latest Price
Place of Origin:
Shaanxi, China
Brand Name:
BJYTL
Model Number:
Mo 99.95%
Payment & Shipping
Payment Methods:
Port of Shipment:
Shanghai/Qingdao
Delivery Detail:
Delivery time depends on order quantity.
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Place of Origin
Shaanxi, China
Brand Name
BJYTL
Model Number
Mo 99.95%
Application
industry, aerospace,vacuum coating
Technique
forged Wall thickness:100~600mm
Dimensions
acc. to customers' requirement
Grade
Mo1 Mo 2
Powder Or Not
Not Powder
Ti Content (%)
more than 96.6%
molybdenum sputtering target for photoelectron and semiconductor
tem name |
Molybdenum target |
Standard |
ASTM B387 GB/T 4188-84 GB/T 17792-1999 |
Material |
Mo1, TZM |
type |
plate target, round target, tube target |
Specification |
Square target:Length 50-1000mm width 50-300mm Round target:Dia 30-280mm thickness 3-50mm |
Packing |
Export wooden case outside and vacuum coating inside |
MOQ |
10pcs |
Lead time |
Within 7~10 work days after deposit |
Payment |
T/T, Western Union,Money Gram, paypal , Trade Assurance |
use |
Electronic semiconductor, Recording media, Graphic display, Glass coating, Solar Photovoltaic Application. |
Loading port |
Shanghai, qingdao, Shenzhen |
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Business Type
Manufacturer, Trading Company
Year Established
2007
Factory Size
1,000-3,000 square meters
Total Employees
11 - 50 People
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