360L industrial ultrasonic cleaner with auto lift system for cleaning semiconductor wafer on electronic

360L industrial ultrasonic cleaner with auto lift system for cleaning semiconductor wafer on electronic

.SUS 304 stainless steel tank
.Industrial grade integrated circuit
.0-80ºC temperature range
.1-99 minutes working time
.Power adjustable
.Auto lift and swill or agitating
.Dewaxing and degreasing function
.28KHz for gross rinse or 40KHz for intensive rinse
.Auto stand-by, sleep, and wake-up by one key-press mode
.Digital controller of high-precision and a long service-life

Ultrasonic energy exists in a liquid as alternate rarefactions and compressions of the liquid. During rarefaction, small vacuum cavities are formed which collapse, or implode, during compression. This continuing rapid process, called cavitation, is responsible for the scrubbing effect which produces ultrasonic cleaning. Three factors affecting the scrubbing action are the degree of liquid degassing, the ultrasonic frequency and the chemical characteristics of the liquid at specific temperatures.

Industrial ultrasonic cleaners are suitable to clean irregular and complex specialized instruments,

components and PCBs of sundry shops, workshops, factories, etc.