ZnS Target Ceramic Target for Sputtering 4N
ceramic target
ZnS target
Purity: 3N5
Processing Method: HP
Surface Condition: Ground
Relative Specific: 80% Min
Dimension: L:210mm max; W:210mm max; T:21mm max
Evaporation Temperature : 1000-1100°C
Transmitting Range : 0.4-14μm
Refractive Index/Wavelength: 2.4/0.10μm
Application: used as Coating material
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