Silicon Dioxide Target for Sputtering Wafer Ceramic Target
silicon dioxide
Purity: SiO2 4N min. or4N5 min.
Surface Condition: Without inclusion and scratch, unpolished.
Rough or Transparent
Transmitting Range: 0.35-2um
Refractive Index/Wavelength: 1.46/0.55μm
Condation: powder or solid
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