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Silicon Dioxide Target for Sputtering Wafer Ceramic Target

Silicon Dioxide Target for Sputtering Wafer Ceramic Target photo-1
US$ 50 - 500 MOQ: 5 Pieces
Key Specifications
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Place of Origin:
Liaoning, China
Brand Name:
King Choice
Model Number:
N/A
Payment & Shipping
Payment Methods:
Port of Shipment:
Dalian China
Delivery Detail:
Delivery time depends on order quantity.
Place of Origin Liaoning, China
Brand Name King Choice
Model Number N/A
Application sputtering target
Shape Disc, square, etc
Material silicon dioxide
Dimensions according to customer's request
Chemical Composition SiO2

silicon dioxide Target for sputtering wafer ceramic target

 

silicon dioxide

 

Purity: SiO2 4N min. or4N5 min.

 

Surface Condition: Without inclusion and scratch, unpolished.

 

Rough or Transparent

 

Transmitting Range: 0.35-2um

 

Refractive Index/Wavelength: 1.46/0.55μm

 

Condation: powder or solid

 

For more information, pls feel free to contact us.

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Business Type
Manufacturer, Trading Company
Year Established
2002
Factory Size
3,000-5,000 square meters
Total Employees
11 - 50 People