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Help Center2014 cr Lens HMC+EMI Defending Coating Machine
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2014 CR lens HMC+EMI Defending Coating machine
Equipment introduction
2014 cr lens HMC+EMI Defending Coating machine can coat multi-layers on viewing window or spectrum element that applied to optical instruments optical lens.
2014 CR lens HMC+EMI Defending Coating machine can be put 3 arc-shaped pieces of sectors or single arc-shaped part.
It can coat multi-layers on viewing window or spectrum element that applied to optical instruments optical lens.
Touching screen + PLC and MDC-360C make up the fully automatic controlling system that can realize parameter input, process monitoring and data saving, technological process setting and auto-operating. It helps improve the quality of film layers.
2014 CR lens HMC+EMI Defending Coating machineFeatures:
1) Capable of equipping ion source or plasma gun for depositing multi-layer and precise optical coatings.
2) When equipped substrate reverses mechanism, it would greatly reduce the processing time, get higher throughput, and lower production cost per unit.
3) With its high-performance layer monitoring system and computerized system, it can fulfill precise thickness requirement for optical layer coating.
4) Process control system runs on windows system interface and easy to use.
5) Repeatable and reliable coating.
CR lens HMC+EMI Defending Coating machine Application
It is suitable for coating anti-reflection coating, optical filter, multicolor, red, yellow, green and blue on optics lens, electronics, acrylic, glass, lamps, mobile viewing window, glasses, lighting.
2014 CR lens HMC+EMI Defending Coating machine Samples:
Main technology parameter (2014 CR lens HMC+EMI Defending Coating machine):
Model |
OEC-630 |
OEC-1350 |
OEC-1500 |
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Chamber size |
Φ630 |
1350 |
1500 |
|
800 |
1500 |
1700 |
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fixture |
Arch-shaped 3 pieces of sector or single arch-shaped part |
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Pumping time |
From atmosphere to 5.0x10-3Pa<15min (unloaded) |
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Ultimate vacuum |
≤5x10-4Pa |
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Evaporation source |
2 groups resistance evaporation, single power source |
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E-beam, high pressure, adjustable | ||||
Ion source |
Kerr source, double filament, power: 2KW |
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Film thickness controller |
MDC-360C crystal film thickness controller or SQC-310, 9704 optical film thickness controller |
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Controlling system |
Crystal touching screen and PLC make up the fully automatic controlling system, ( Automatic/ Manual) |
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Thickness Method |
Crystal Monitor/ Admittance Monitor |
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Baking system |
350, PID thermostatic control,9KW |
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Used for |
Optical lens, glass products, ornaments, lamps, plastic products |
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Remark |
Can be designed according to customers request |
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After getting customer's requirements, we make full manufacturing specifications in details.
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