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Help CenterAluminum Thin Film Material
Negotiable
MOQ: 1 set (Price negotiable depending on order volume and customization)
Key Specifications
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Thickness:
Brand Name:
Plansee
Model Number:
Aluminum sputtering target
Payment & Shipping
Payment Methods:
Port of Shipment:
China
Delivery Detail:
Delivery time depends on order quantity.
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Brand Name
Plansee
Model Number
Aluminum sputtering target
Aluminum is used for PVD metallization in thin-film transistors for TFT-LCD for displays. Aluminum sputtering targets are highly pure and therefore ensure best conductivity of the material. A homogenous microstructure and superior surface quality of the targets guarantee less particle formation during sputtering and uniform erosion.
Material properties:
Density [g/cm3]: > 2,70
Purity [%] > 99,999 (5N)
Hardness [HV1]: 16
Thermal conductivity [W/(mxK)]: 238
Send Inquiry to This Supplier
Business Type
Manufacturer
Year Established
1921
Factory Size
Below 1,000 square meters
Total Employees
Above 1000 People
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